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EUV Monochromator and Beamlines

The EUV monochromator enables the isolation of single harmonics from the comb-like spectrum generated by high harmonic generation, employing versatile optical reflection modules to spatially split monochromatic and polychromatic beamlines. This setup satisfies diverse wavelength separation and filtering requirements, enabling independent experimentation with both monochromatic and polychromatic beams.

Main Features
Effective with high performance, and equipped with miniaturized devices
HHG light sources feature a compact footprint, enabling the setup of a complete system within the confines of a laboratory space, making it more suitable for productization
Short wavelength, high precision.
EUV technology utilizes wavelengths shorter than those of DUV technology, facilitating higher resolution. Deep Ultraviolet (DUV) typically employs light sources with wavelengths above 100 nm, whereas Extreme Ultraviolet (EUV) technology employs light sources with a wavelength of 13.5 nm.
Based on coherence, lenses are not required.
Coherence enables lensless imaging techniques, such as coherent diffraction imaging, ptychography, and holography, which offer spatial resolution at EUV wavelengths for non-destructive evaluation and assessment.
Technical Parameter
Technology Pathway Light Source Characteristics Wavelength Power Output Maximum Repetition Rate Representative Applications Downstream Application Examples and Representative Companies
Accelerated Electron Beam Technology Large-scale Scientific Facilities, Lasers, and Free-Electron Lasers

0.1nm-100nm

1mW-1W

100 kHz

Research

Europe XFEL

United States LCLS

Discharge Plasma Incoherent Light, Technically diverse and cost-intensive.

13.5nm

100-500 W

50-100 kHz

Lithography

ASML(Cymer)

Nonlinear optics applications (companies) Full-spectrum lasers featuring compact size and low cost, quasi-continuous comb-like ultra-wide spectral range

10nm – 100nm

0.1 mW-1mW

10-100 kHz

Defect detection, microscopy

laser direct writing lithography, and photoresist development, among others.

Intel

ASML

TSMC

Samsung

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