The EUV monochromator enables the isolation of single harmonics from the comb-like spectrum generated by high harmonic generation, employing versatile optical reflection modules to spatially split monochromatic and polychromatic beamlines. This setup satisfies diverse wavelength separation and filtering requirements, enabling independent experimentation with both monochromatic and polychromatic beams.
Technology Pathway | Light Source Characteristics | Wavelength | Power Output | Maximum Repetition Rate | Representative Applications | Downstream Application Examples and Representative Companies |
Accelerated Electron Beam Technology | Large-scale Scientific Facilities, Lasers, and Free-Electron Lasers | 0.1nm-100nm | 1mW-1W | 100 kHz | Research | Europe XFEL United States LCLS |
Discharge Plasma | Incoherent Light, Technically diverse and cost-intensive. | 13.5nm | 100-500 W | 50-100 kHz | Lithography | ASML(Cymer) |
Nonlinear optics applications (companies) | Full-spectrum lasers featuring compact size and low cost, quasi-continuous comb-like ultra-wide spectral range | 10nm – 100nm | 0.1 mW-1mW | 10-100 kHz | Defect detection, microscopy laser direct writing lithography, and photoresist development, among others. | Intel ASML TSMC Samsung |
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