Extreme Ultraviolet (EUV) Imaging Spectrometer

EUV Imaging Spectrometer: Equipped with a front-end EUV spectrometer for selecting specific EUV wavelengths, featuring a large vacuum chamber housing multiple motorized vacuum mirror mounts and a multi-axis sample stage with adjustable degrees of freedom. It also incorporates a wide-spectral-response EUV camera with selectable target surfaces, catering to mono-/multi-chromatic imaging and spectroscopy needs from visible to EUV light.

Interference Lithography System: Boasts a spacious vacuum chamber with a highly automated interference module adjustable for interferometric lithography applications across visible to EUV spectra. Optionally, imaging camera can be integrated for auxiliary measurements.

Main Features

Effective with high performance, and equipped with miniaturized devices

HHG light sources feature a compact footprint, enabling the setup of a complete system within the confines of a laboratory space, making it more suitable for productization

Short wavelength, high precision.

EUV technology utilizes wavelengths shorter than those of DUV technology, facilitating higher resolution. Deep Ultraviolet (DUV) typically employs light sources with wavelengths above 100 nm, whereas Extreme Ultraviolet (EUV) technology employs light sources with a wavelength of 13.5 nm.

Based on coherence, lenses are not required.

Coherence enables lensless imaging techniques, such as coherent diffraction imaging, ptychography, and holography, which offer spatial resolution at EUV wavelengths for non-destructive evaluation and assessment.

Technical Parameter

Technology Pathway	Light Source Characteristics	Wavelength	Power Output	Maximum Repetition Rate	Representative Applications	Downstream Application Examples and Representative Companies
Accelerated Electron Beam Technology	Large-scale Scientific Facilities, Lasers, and Free-Electron Lasers	0.1nm-100nm	1mW-1W	100 kHz	Research	Europe XFEL United States LCLS
Discharge Plasma	Incoherent Light, Technically diverse and cost-intensive.	13.5nm	100-500 W	50-100 kHz	Lithography	ASML(Cymer)
Nonlinear optics applications (companies)	Full-spectrum lasers featuring compact size and low cost, quasi-continuous comb-like ultra-wide spectral range	10nm – 100nm	0.1 mW-1mW	10-100 kHz	Defect detection, microscopy laser direct writing lithography, and photoresist development, among others.	Intel ASML TSMC Samsung

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